„Atomic and Molecular Layer Deposition: Shaping and functionalizing future materials”

---

Zapraszamy na Środowiskowe Seminarium Fizyki Ciała Stałego i Seminarium ACMiN, które odbędzie się w środę 24 października 2018r. o godz. 9.00 w Sali Audytoryjnej ACMiN AGH na II piętrze budynku D-16 (ul. Kawiory 30).

Referat pod tytułem „Atomic and Molecular Layer Deposition: Shaping and functionalizing future materials” wygłosi Dr Ivo Utke (Empa - Swiss Federal Laboratories for Materials Science and Technology, Szwajcaria).

Streszczenie seminarium

Atomic layer deposition (ALD) offers unprecedented control over film thickness at monolayer precision as well as unsurpassed coating conformality in materials with open porosity architecture. The enabling concept of ALD relies on self-terminating surface reactions of at least two gas precursors which are sequentially introduced and purged into the growth reactor. Growth temperatures are chosen such that the precursor molecules do not completely thermally dissociate but rather chemisorb on the surface. This feature also opens the field to coatings on more heat sensitive polymer and biomaterial. While ALD was mainly investigated for inorganic film materials, more recently, the self-limiting growth involving organic molecules opened a novel hybrid organic-inorganic material class with tunable materials parameters to be deposited. This talk will introduce the fundamental concepts of atomic and molecular layer deposition, give a short overview on the field and showcase our investigations on TiO₂, Al₂O₃, ZnO, Y2O₃, and Al(EG) coatings for applications in solar energy conversion and storage.

---